The investigation of thin film growth process with semiconductor materials: A Kinetic Monte Carlo study
博士 === 淡江大學 === 化學學系博士班 === 96 === Applying Kinetic Monte Carlo (KMC) technique, we investigated the influence of temperature and step-width on the step-flow growth of a (2D+1) semiconductor-like uniform-spacing stepped model with inverse Ehrlich-Schwoebel (iES) barrier (chapter 5, part I) and the...
Main Authors: | Yih-Jiun Lin, 林奕君 |
---|---|
Other Authors: | 王伯昌 |
Format: | Others |
Language: | zh-TW |
Published: |
2008
|
Online Access: | http://ndltd.ncl.edu.tw/handle/64948331276749260045 |
Similar Items
-
A kinetic Monte Carlo study for stripe-like magnetic domains in ferrimagnetic thin films
by: Tyukodi Botond, et al.
Published: (2013-04-01) -
Kinetic Monte Carlo simulations of nanocrystalline film deposition
by: Ruan, Shiyun, et al.
Published: (2013) -
An off-lattice kinetic Monte Carlo method for the investigation of grain boundary kinetic processes
by: Alexander, Kathleen Carmody
Published: (2017) -
Monte Carlo and Kinetic Monte Carlo Models for Deposition Processes: A Review of Recent Works
by: Nikolaos Cheimarios, et al.
Published: (2021-04-01) -
Nucleation and Growth in Materials and on Surfaces:Kinetic Monte Carlo Simulation and Rate Equation Theory
by: Shi, Feng
Published: (2008)