The application and fabrication of an optical anisotropic SiO2 thin film
碩士 === 國立臺北科技大學 === 光電工程系研究所 === 96 === In this work, SiO2 anisotropic thin films were fabricated by the glancing angle deposition (GLAD) technique with various deposition angles in the electron-beam gun evaporation system. The polarization conversion reflection (PCR) of the anisotropic film is meas...
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| Format: | Others |
| Language: | zh-TW |
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2008
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| Online Access: | http://ndltd.ncl.edu.tw/handle/k6edqg |
| Summary: | 碩士 === 國立臺北科技大學 === 光電工程系研究所 === 96 === In this work, SiO2 anisotropic thin films were fabricated by the glancing angle deposition (GLAD) technique with various deposition angles in the electron-beam gun evaporation system. The polarization conversion reflection (PCR) of the anisotropic film is measured by coupling the film with high-index prism, and can be calculated with the Berreman Matrix. The optical constants are derived by fitting the measured PCR angular spectrum curves.
The film thickness of the third layer is designed to excite both the surface plasmon resonance (SPR) and polarization conversion reflection in the three-layered configuration (the prism/ anisotropic thin film/ metal film/ isotropic film).This work proposes that a tilt columnar thin film in the configuration trigger the TE-polarized incident light to excite SPR. By arranging an anisotropic thin film between a coupling prism and a metal film enables TM-polarized and TE-polarized waves simultaneously to excite surface plasmons.
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