| Summary: | 碩士 === 國立臺灣科技大學 === 高分子系 === 96 === The patterned poly (2-Hydroxyethyl methacrylate) (PHEMA) polymer brushes were grafted on the silicon surface by using atom transfer radical polymerization (ATRP) method. The silicon wafer surface patterned by electron beam lithography was treated oxygen plasma to increase the hydroxyl groups, then the samples were immersed into the 11-(2-Bromo-2-methyl)propionyloxyundecenyltrichlorosilane as the initiator of self-assembled monolayer to modify the surface through the hydroxyl group on the silicon wafer. The PHEMA brushes on the silicon wafer surface were grafted by using 2,2’-Bypyridine、 CuCl、CuBr2 and 2-Hydroxyethyl methacrylate (HEMA) as the ligand, catalytic and monomer for ATRP, respectively. The Electron Spectroscopy for Chemical Analysis (ESCA) was utilized to analyze the surface element of SAMs of initiator and PHEMA polymer brushes. The thickness of PHEMA brushes polymerized after 24 hours was about 424 nm measured by ellipisometer. The morphology of patterned SAMs and PHEMA brushes were investigated by atomic force microscopy (AFM) and scanning electron microscopy (SEM). Therefore, the fabricated process of patterned PHEMA brushes on the silicon surface was established and the ferritin was successfully adhered to the pattered polymer brushes in this work.
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