Sliding Mode Control of a Multi-Axes Piezoelectric Positioning Stage Based on Hysteresis Model
碩士 === 國立臺灣大學 === 機械工程學研究所 === 96 === E-beam lithography(EBL) is one of the lithographic technique, and it is considered the most potential technique to be the key of semiconductor process in the next generation. Thus, high performance stage is necessary. In this thesis we design a precision six deg...
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| Format: | Others |
| Language: | zh-TW |
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2008
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| Online Access: | http://ndltd.ncl.edu.tw/handle/83805919233697283768 |