Interconnect Optimization Considering Optical Proximity Correction

碩士 === 國立臺灣大學 === 電子工程學研究所 === 96 === As devices are packed in ever-closer proximity in the nanometer technology, the distortions of design shapes are getting more and more serious. Distortions introduced by the interference which is the diffraction caused by small design shapes can be regarded as a...

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Bibliographic Details
Main Authors: Shih-Lun Huang, 黃士倫
Other Authors: 張耀文
Format: Others
Language:en_US
Published: 2008
Online Access:http://ndltd.ncl.edu.tw/handle/63116699786198186953