Interface traps of the N-type MOS structure with Ge nanocrystals characterized by G-V measurement and Si electron-luminescence

碩士 === 國立臺灣大學 === 電子工程學研究所 === 96 === In this work, Metal-Oxide-Semiconductor structure with germanium nanocrystals formed by E-gun evaporator for charge storage and luminescence is fabricated. Fabricated devices are characterized by Transmission Electron Microscope. In the characterization of memor...

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Main Authors: Ko-Chun Lin, 林可淳
Other Authors: 管傑雄
Format: Others
Language:zh-TW
Published: 2008
Online Access:http://ndltd.ncl.edu.tw/handle/95863045534093738187
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spelling ndltd-TW-096NTU054280452016-05-11T04:16:25Z http://ndltd.ncl.edu.tw/handle/95863045534093738187 Interface traps of the N-type MOS structure with Ge nanocrystals characterized by G-V measurement and Si electron-luminescence 利用電導-電壓及矽的電激發光量測研究N型鍺量子點金氧半結構之介面缺陷特性 Ko-Chun Lin 林可淳 碩士 國立臺灣大學 電子工程學研究所 96 In this work, Metal-Oxide-Semiconductor structure with germanium nanocrystals formed by E-gun evaporator for charge storage and luminescence is fabricated. Fabricated devices are characterized by Transmission Electron Microscope. In the characterization of memory performance of devices with different PMA time, high frequency capacitance-voltage (C-V) measurement is used to measure the memory window for comparing the charge storage capacity. Frequency varied from 1000kHz to 5kHz which means exchanging speeds are slower, but the memory windows still exist. The carriers charged in Ge dots are independent of frequency. On the other hand, in conductance-voltage (G-V) measurement, the conductance of sample with PMA 1 minute is larger than sample with PMA 9 minutes, when frequency is more than 100 kHz. The result helps us to establish the model of the trap distribution, and characterize that PMA can neutralize the shallow trap. The peak values are larger with higher frequency and shift to positive bias, which means that the slow trap density is larger near band edge and smaller in mid band. The luminescence mechanism is figured out by electron -luminescence (E-L) measurement. Holes are hopping though the traps in SiO2, and into Si substrate to recombination with the majority carriers-electrons. Triggered by DC mode, blackbody radiation caused by heat would effect Si E-L measurement. For improving luminescence efficiency, device must be triggered by the optimum frequency-1Hz matched the velocity of hole tunneling though oxide. Holes will be trapped in oxide instead of passing through in higher frequency, hence the recombination electron-hole pairs decreased. Luminescence of Si increased about 40 times, because of triggered by pulse mode. Sample with PMA 13 minutes has better luminescence efficiency than sample with PMA 1 minute more than twice in time-domain luminescence measurement. This result agree with G-V measurement, which is PMA can neutralize the fast traps and make holes pass through oxide easier. 管傑雄 2008 學位論文 ; thesis 47 zh-TW
collection NDLTD
language zh-TW
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description 碩士 === 國立臺灣大學 === 電子工程學研究所 === 96 === In this work, Metal-Oxide-Semiconductor structure with germanium nanocrystals formed by E-gun evaporator for charge storage and luminescence is fabricated. Fabricated devices are characterized by Transmission Electron Microscope. In the characterization of memory performance of devices with different PMA time, high frequency capacitance-voltage (C-V) measurement is used to measure the memory window for comparing the charge storage capacity. Frequency varied from 1000kHz to 5kHz which means exchanging speeds are slower, but the memory windows still exist. The carriers charged in Ge dots are independent of frequency. On the other hand, in conductance-voltage (G-V) measurement, the conductance of sample with PMA 1 minute is larger than sample with PMA 9 minutes, when frequency is more than 100 kHz. The result helps us to establish the model of the trap distribution, and characterize that PMA can neutralize the shallow trap. The peak values are larger with higher frequency and shift to positive bias, which means that the slow trap density is larger near band edge and smaller in mid band. The luminescence mechanism is figured out by electron -luminescence (E-L) measurement. Holes are hopping though the traps in SiO2, and into Si substrate to recombination with the majority carriers-electrons. Triggered by DC mode, blackbody radiation caused by heat would effect Si E-L measurement. For improving luminescence efficiency, device must be triggered by the optimum frequency-1Hz matched the velocity of hole tunneling though oxide. Holes will be trapped in oxide instead of passing through in higher frequency, hence the recombination electron-hole pairs decreased. Luminescence of Si increased about 40 times, because of triggered by pulse mode. Sample with PMA 13 minutes has better luminescence efficiency than sample with PMA 1 minute more than twice in time-domain luminescence measurement. This result agree with G-V measurement, which is PMA can neutralize the fast traps and make holes pass through oxide easier.
author2 管傑雄
author_facet 管傑雄
Ko-Chun Lin
林可淳
author Ko-Chun Lin
林可淳
spellingShingle Ko-Chun Lin
林可淳
Interface traps of the N-type MOS structure with Ge nanocrystals characterized by G-V measurement and Si electron-luminescence
author_sort Ko-Chun Lin
title Interface traps of the N-type MOS structure with Ge nanocrystals characterized by G-V measurement and Si electron-luminescence
title_short Interface traps of the N-type MOS structure with Ge nanocrystals characterized by G-V measurement and Si electron-luminescence
title_full Interface traps of the N-type MOS structure with Ge nanocrystals characterized by G-V measurement and Si electron-luminescence
title_fullStr Interface traps of the N-type MOS structure with Ge nanocrystals characterized by G-V measurement and Si electron-luminescence
title_full_unstemmed Interface traps of the N-type MOS structure with Ge nanocrystals characterized by G-V measurement and Si electron-luminescence
title_sort interface traps of the n-type mos structure with ge nanocrystals characterized by g-v measurement and si electron-luminescence
publishDate 2008
url http://ndltd.ncl.edu.tw/handle/95863045534093738187
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