A Study on High-k Dielectrics of Organic Thin Film Transistors

碩士 === 國立臺灣大學 === 材料科學與工程學研究所 === 96 === This study uses atomic layer deposition (ALD) to develop ultra-thin high-dielectric-constant (high-k) gate dielectrics for poly-3-hexthylthiophene (P3HT) organic thin film transistors (OTFTs), aiming to minimize the operation voltage of the OTFTs without comp...

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Bibliographic Details
Main Authors: Chun-Chan Hsiao, 蕭君展
Other Authors: Feng-Yu Tsai
Format: Others
Language:en_US
Published: 2008
Online Access:http://ndltd.ncl.edu.tw/handle/24478618920911952555