A Study on High-k Dielectrics of Organic Thin Film Transistors
碩士 === 國立臺灣大學 === 材料科學與工程學研究所 === 96 === This study uses atomic layer deposition (ALD) to develop ultra-thin high-dielectric-constant (high-k) gate dielectrics for poly-3-hexthylthiophene (P3HT) organic thin film transistors (OTFTs), aiming to minimize the operation voltage of the OTFTs without comp...
Main Authors: | , |
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Other Authors: | |
Format: | Others |
Language: | en_US |
Published: |
2008
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Online Access: | http://ndltd.ncl.edu.tw/handle/24478618920911952555 |