The Effect of Interfacial Treatment to Work Function of the Metal Gate and the Implantation of Ytterbium to the Lightly Doped Drain Area
碩士 === 臺灣大學 === 光電工程學研究所 === 96 === With CMOS is scaling down, using metal gate will make devices perform better. Traditional poly-gate is restricted by material characteristic - gate depletion effect. The effect will decrease the gate capacitance, and increase the operation voltage. The depletion w...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2007
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| Online Access: | http://ndltd.ncl.edu.tw/handle/75958962455070113760 |