Electrical Characteristics of MOS Devices with Stacked MoN and TiN High Work Function Metal Gates

碩士 === 國立清華大學 === 工程與系統科學系 === 96 ===

Bibliographic Details
Main Authors: Hsueh-Yueh Lu, 呂學岳
Other Authors: Kuei-Shu Chang-Liao
Format: Others
Language:zh-TW
Published: 2008
Online Access:http://ndltd.ncl.edu.tw/handle/50544498528424421314