Performance and Stability Analysis of EI Controller under Dynamic Models

碩士 === 國立清華大學 === 統計學研究所 === 96 === Run-to-run (R2R) process control is well developed in semiconductor manufacturing communities. The exponential weighted moving average (EWMA) controller that is a popular model-based R2R controller has received great attention in literature. However, in practical...

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Main Authors: Jan, Yu-Hung, 詹昱宏
Other Authors: Tseng, Sheng-Tsaing
Format: Others
Language:zh-TW
Published: 2008
Online Access:http://ndltd.ncl.edu.tw/handle/56744978412157175518
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spelling ndltd-TW-096NTHU53370212015-11-27T04:04:16Z http://ndltd.ncl.edu.tw/handle/56744978412157175518 Performance and Stability Analysis of EI Controller under Dynamic Models EI控制器在動態模型下之績效及穩定性分析 Jan, Yu-Hung 詹昱宏 碩士 國立清華大學 統計學研究所 96 Run-to-run (R2R) process control is well developed in semiconductor manufacturing communities. The exponential weighted moving average (EWMA) controller that is a popular model-based R2R controller has received great attention in literature. However, in practical applications, the process I-O model is complex and hybrid, and the effect of the input recipe on the output response can be carried over several periods. The Single EWMA controller is a MMSE controller for the static I-O model with the process disturbance following IMA(1,1) and the process parameters being known. It does not eliminate the effects on the dynamic parameters and cause a highly initial bias for the first few batches. In this paper we propose the Exponentially Integral (EI) controller to adjust the dynamic models. First, we derive the stability condition of EI controller and the optimal discount factor, and provide a robust discount factor selection. Finally, comparing with a Single EWMA controller, the performance of EI controller is better than Single EMWA controller under various combinations of parameter, especially in the dynamic parameter large. Tseng, Sheng-Tsaing 曾勝滄 2008 學位論文 ; thesis 53 zh-TW
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description 碩士 === 國立清華大學 === 統計學研究所 === 96 === Run-to-run (R2R) process control is well developed in semiconductor manufacturing communities. The exponential weighted moving average (EWMA) controller that is a popular model-based R2R controller has received great attention in literature. However, in practical applications, the process I-O model is complex and hybrid, and the effect of the input recipe on the output response can be carried over several periods. The Single EWMA controller is a MMSE controller for the static I-O model with the process disturbance following IMA(1,1) and the process parameters being known. It does not eliminate the effects on the dynamic parameters and cause a highly initial bias for the first few batches. In this paper we propose the Exponentially Integral (EI) controller to adjust the dynamic models. First, we derive the stability condition of EI controller and the optimal discount factor, and provide a robust discount factor selection. Finally, comparing with a Single EWMA controller, the performance of EI controller is better than Single EMWA controller under various combinations of parameter, especially in the dynamic parameter large.
author2 Tseng, Sheng-Tsaing
author_facet Tseng, Sheng-Tsaing
Jan, Yu-Hung
詹昱宏
author Jan, Yu-Hung
詹昱宏
spellingShingle Jan, Yu-Hung
詹昱宏
Performance and Stability Analysis of EI Controller under Dynamic Models
author_sort Jan, Yu-Hung
title Performance and Stability Analysis of EI Controller under Dynamic Models
title_short Performance and Stability Analysis of EI Controller under Dynamic Models
title_full Performance and Stability Analysis of EI Controller under Dynamic Models
title_fullStr Performance and Stability Analysis of EI Controller under Dynamic Models
title_full_unstemmed Performance and Stability Analysis of EI Controller under Dynamic Models
title_sort performance and stability analysis of ei controller under dynamic models
publishDate 2008
url http://ndltd.ncl.edu.tw/handle/56744978412157175518
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