| Summary: | 碩士 === 國立清華大學 === 統計學研究所 === 96 === Run-to-run (R2R) process control is well developed in semiconductor manufacturing communities. The exponential weighted moving average (EWMA) controller that is a popular model-based R2R controller has received great attention in literature. However, in practical applications, the process I-O model is complex and hybrid, and the effect of the input recipe on the output response can be carried over several periods. The Single EWMA controller is a MMSE controller for the static I-O model with the process disturbance following IMA(1,1) and the process parameters being known. It does not eliminate the effects on the dynamic parameters and cause a highly initial bias for the first few batches. In this paper we propose the Exponentially Integral (EI) controller to adjust the dynamic models. First, we derive the stability condition of EI controller and the optimal discount factor, and provide a robust discount factor selection. Finally, comparing with a Single EWMA controller, the performance of EI controller is better than Single EMWA controller under various combinations of parameter, especially in the dynamic parameter large.
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