Fabrication of AlxGa1-xN/GaN nanowires for metal oxide semiconductor field effect transistor by focus ion beam

碩士 === 國立中山大學 === 物理學系研究所 === 96 === We have grown the high quality AlGaN/GaN heterostructure by plasma-assisted molecular beam epitaxy. We obtained the mobility of two-dimensional electron gas of the AlGaN/GaN is 9300 cm2/Vs and carrier concentration is 7.9×1012 cm-2 by conventional van der Pauw Ha...

Full description

Bibliographic Details
Main Authors: Chia-Ching Yang, 楊佳慶
Other Authors: Ikai Lo
Format: Others
Language:zh-TW
Published: 2008
Online Access:http://ndltd.ncl.edu.tw/handle/3wudgr

Similar Items