摻雜Cr及V對AZO透明導電膜應用於染料敏化太陽能電池前電極之研究

• Main Author: 張嘉翔
• Other Authors: 林義成
• Format: Others
• Language: zh-TW
• Published: 2008
• Online Access: http://ndltd.ncl.edu.tw/handle/00317300840710833782

碩士 === 國立彰化師範大學 === 顯示技術研究所 === 96 === This study is the effects of optical and electronic properties, chemical stability and heat stability of AZO films doped with different weight percent of chromium and vanadium. Substrate bias and oxygen flow rate were adjusted in sputtering processes to obtain an optimum parameters. Al, Cr and V were doped by changing their positions on the ZnO target. The corrosion rate, deposition rate, crystalline, electric resistivity, transmittance, energy gap, surface morphology, root mean square(Rms) roughness, and heat stability of the AZO film were measured by α-step, x-ray diffraction(XRD), four-point probe, hall effect measurement system, spectrometer, atomic force microscopy(AFM) and impedance analysis system, respectively. The composition analysis and depth profile of the AZO:Cr:V thin film were analyzed by EDS. According to the result, AZO dopping Cr and V is useful to improve its chemical and heat stability. At the parameters of Cr/V=0.30/0.23wt.％, power 150W, working distance 5.5cm, substrate temperature 473K, working pressure 0.4 Pa and frequency 10kHz, we can obtain the resistivity of AZO:Cr:V thin film is 4.23×10-4Ωcm. This is great than 6.5×10-4Ωcm of FTO film, but inferior than 1.2×10-4Ωcm of ITO film. The resistivity is increased about 0.27% after corrosion in electrolyte. That is similar to the 0.16% increase of ITO film. After 673K thermal cycle test, the resistivity of AZO:Cr:V, ITO and FTO films increased 28.1%, 352% and no increased, respectively. Although the heat stability of FTO film is better than each other, it’s original resistivity are higher than AZO:Cr:V and ITO films after annealed.