The fabrication and application of nanostencil mask
碩士 === 國立彰化師範大學 === 光電科技研究所 === 96 === A novel fabrication process has been developed for making nanometer-scaled current-perpendicular-to-plane (CPP) device through a nanostencil. The template structure consisting of Si3N4-coated silicon substrate / Pt (20) / SiO2 (x) / Ge (15) (thickness in nm and...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2008
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| Online Access: | http://ndltd.ncl.edu.tw/handle/72972317491343836889 |