Simulation of the Transport Phenomena in a Pulsed-Pressure Chemical Vapor Deposition (PPCVD) Process

碩士 === 國立交通大學 === 工學院碩士在職專班精密與自動化工程組 === 96 === Previously pulsed-pressure chemical vapor deposition (PPCVD) process has been demonstrated it could yield highly uniform thin film deposition as compared to conventional thermal chemical vapor deposition process. In addition, very high material convers...

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Bibliographic Details
Main Author: 林宗漢
Other Authors: Jong-Shinn Wu
Format: Others
Language:zh-TW
Published: 2007
Online Access:http://ndltd.ncl.edu.tw/handle/wkq6xy

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