Simulation of the Transport Phenomena in a Pulsed-Pressure Chemical Vapor Deposition (PPCVD) Process
碩士 === 國立交通大學 === 工學院碩士在職專班精密與自動化工程組 === 96 === Previously pulsed-pressure chemical vapor deposition (PPCVD) process has been demonstrated it could yield highly uniform thin film deposition as compared to conventional thermal chemical vapor deposition process. In addition, very high material convers...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2007
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| Online Access: | http://ndltd.ncl.edu.tw/handle/wkq6xy |