Influence of adding methane or acetylene into argon plasma to the properties of hydrogenated amorphous carbon films deposited by unbalanced magnetron sputtering
碩士 === 國立成功大學 === 材料科學及工程學系碩博士班 === 96 === Hydrogenated Amorphous Carbon (a-C:H) films was deposited on the silicon substrate by unbalanced magnetron sputtering with the addition of methane (CH4) or acetylene (C2H2) and the variation of flowing rates from 2 to 10 sccm into argon plasma. The flowing...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2008
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/30534389218335499707 |