Patterning self-assembled monolayers for micro-lithography and molecular exchange using downstream microwave plasma
碩士 === 國立成功大學 === 材料科學及工程學系碩博士班 === 96 === Self-assembled monolayers (SAMs) can behave as negative or positive resist after irradiated by physical sources such as X-ray, electron beam or ion beam. As well, the electron beam irradiated SAMs can thereafter promote exchange reactions with other SAMs mo...
| Main Authors: | , |
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2008
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| Online Access: | http://ndltd.ncl.edu.tw/handle/16776494599018839030 |