Investigation of three-dimension lithography using a laser direct writing technique
碩士 === 國立中興大學 === 精密工程學系所 === 96 === For a conventional photolithography technique, two-dimensional or three-dimensional patterns always need single or multiple masks to make repetitive exposure processes. Once the masks are contaminated by residual photoresist (PR) or particle defects, the photolit...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2008
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| Online Access: | http://ndltd.ncl.edu.tw/handle/33774043279160500059 |