Characteristics and Microstructure of Buffer Layer Induced Crystalline AlN Thin Films Prepared by DC Sputtering
碩士 === 國立中興大學 === 材料科學與工程學系 === 96 === Aluminum nitride (AlN) exhibits superior properties such as good thermal stability, chemical stability, hardness, and high optical transparency. These characteristics render itself in many applications, e.g. surface acoustics wave device, diffusion barrier laye...
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| Format: | Others |
| Language: | zh-TW |
| Online Access: | http://ndltd.ncl.edu.tw/handle/00136928224016972571 |