Fabrication of post plasma treated aluminum doped zinc oxide thin films for solar cell applications

碩士 === 國立中興大學 === 光電工程研究所 === 96 === The experiment can be divided into two sections: AZO films are prepared by r.f. magnetron sputtering system and PECVD follows up a post plasma treatment on the pre-sputtering films. The related influences of substrate temperature, working pressure and different H...

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Bibliographic Details
Main Authors: Ying-Ching Chen, 陳穎慶
Other Authors: Fang-Hsing Wang
Format: Others
Language:zh-TW
Online Access:http://ndltd.ncl.edu.tw/handle/30749297180337715037