Fabrication of post plasma treated aluminum doped zinc oxide thin films for solar cell applications
碩士 === 國立中興大學 === 光電工程研究所 === 96 === The experiment can be divided into two sections: AZO films are prepared by r.f. magnetron sputtering system and PECVD follows up a post plasma treatment on the pre-sputtering films. The related influences of substrate temperature, working pressure and different H...
Main Authors: | , |
---|---|
Other Authors: | |
Format: | Others |
Language: | zh-TW |
Online Access: | http://ndltd.ncl.edu.tw/handle/30749297180337715037 |