Photocatalytic reaction of TiO2/MCM-41 films prepared by Plasma Enhanced chemical vapor deposition method
碩士 === 國立中興大學 === 化學工程學系所 === 96 === This investigation was prepared MCM-41 catalyst films on silicon wafer in ammonia media, using tetraethyl orthosilicate (TEOS) as a precursor and cetyltrimethylammonium bromide (CTABr) as a surfactant. Afterward, titanium dioxide was coated on the surface of MCM-...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2008
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| Online Access: | http://ndltd.ncl.edu.tw/handle/28252736710543982225 |