Pretreatment of Catalyst Metal by N2 and CF4 Plasma and Their Effects on the Growth of SiOx Nanowires
碩士 === 大葉大學 === 電機工程學系 === 96 === In this work, a layer of 5nm nickel was evaporated onto a (100) silicon substrate and then pre-treated with nitrogen (N2) and tetrafluoromethane (CF4) plasma. Subsequently, SiOx nanowires were synthesized with in a furnace at 1000°C and an argon flow rate of 500scc...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2008
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| Online Access: | http://ndltd.ncl.edu.tw/handle/32422216961666696820 |