| Summary: | 碩士 === 朝陽科技大學 === 環境工程與管理系碩士班 === 96 === The high-tech industry is important for economy development in our country, especially the photoelectricity and the semiconductor industries. In the electronic industry the phosphorus acid was need a cleaning liquid for IC cleaning.The emission of high effluent always cause the water body eutrophication. Therefore, to reduce herefore puts phosphorus emission is become an important subject of the high-tech industrial park.
This research focus on phosphorus removal of a high-tech industrial park wastewater treatment. The objective is to compare the operational cost and the sludge processing cost of different phosphorus removal processes(chemical and biological). This study can provide for wastewater best available control technology evaluation of a high-tech industrial park.
Chemical phosphorus removal results show that compareing,(sodium hydroxide、aluminum sulfate、poly aluminum chloride、ferrous sulfate and ferric chloride),the poly aluminum chloride and aluminum sulfate demonstrate better to performance on phosphorus removal. The removal efficiency is intherange of 66.9 ~97.4%.
Based on experiment result,of operational cost (includeing electric cost、chemical cost and sludge handling cost),shows that the cost of aluminium sulfate is lowest. In addition, glucose is an effective and economic substrate for .
The comparisons of chemical phosphorus removal and biological phosphorus removal show that the chemical phosphorus control process is better than biological phosphorus removal processs on water quality reliability and operational condition.
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