Study on the NiOx Electrochromic Properties

• Main Authors: PENG-SHIH LIN, 林鵬仕
• Other Authors: none
• Format: Others
• Language: zh-TW
• Published: 2008
• Online Access: http://ndltd.ncl.edu.tw/handle/38407874472768334142

碩士 === 中原大學 === 機械工程研究所 === 96 === In this experiment, the nickel oxide thin film was prepared by reactive RF magnetron sputtering with different preparing conditions. Then, the processing parameters such as the oxygen flow, sputtering power, and the thickness of the thin film are tuning to establish the relations among the processing parameters, the microstructure, the morphology, the electrochemical behavior and the optical properties. The 1M KOH solution was used as an electrolyte in the measurement of electrochemistry. As the results in the thin film characteristic, we find that the intensity of the oxidizing nickel diffraction peaks was abated and the peaks were deviated from original position. With the increase of the RF power, the oxidizing nickel diffraction peaks will add three positions such as 37, 62, 75, and 79 degrees. Then, the surface roughness of nickel oxide thin film also increased from 2.995nm to 4.230nm. From the results of cyclic voltmmetry, UV spectrophotometer and surface characteristics, we find that the electrochemical behavior of nickel oxide thin film have relations with the processing parameters and steady trend. We made the nickel oxide thin film with the optimal sputtering conditions such as the oxygen flow of 0sccm, sputtering power of 2.0KW, thickness of 200nm, argon flow of 40sccm. At wavelength 550nm, it had the best optical density change is 0.53, the maximum oxidization peak is 7.844mA/cm2 and the maximum reduction peak is -5.531mA/cm2. In the results, the nickel oxide thin film can reduce the transmittance effectively. Comparing to the other materials, it also show the promising of commercial applications.