Feature Extraction of Radio Frequency Signal for Fault Detection of Plasma Etching Equipment
碩士 === 中原大學 === 機械工程研究所 === 96 === Etch process is an important and indispensable process in the semiconductor manufacturing for removing the pattern defined by photolithography process. Most etched profiles cannot be reworked. Thus, the accuracy of critical dimension, etch depth and etch uniformity...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2008
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| Online Access: | http://ndltd.ncl.edu.tw/handle/85022142379717843193 |