A Study on the Electrochromic Properties of TiO2 thin films

• Main Authors: Yen Hung., 洪嫣
• Other Authors: Ming Chang.
• Format: Others
• Language: zh-TW
• Published: 2008
• Online Access: http://ndltd.ncl.edu.tw/handle/64926496985801924052

碩士 === 中原大學 === 機械工程研究所 === 96 === In this study, the electrochromic material was deposited on ITO/Glass substrates by using reactively RF magnetron sputtering. Utilize various processing parameters such as the thickness of thin film, sputtering power and oxygen flow to deposited TiO2 thin film, and using the electrolyte of 1M LiClO4 in propylene carbonate (PC) to observe the electrochromic properties of TiO2 thin film. Using the X-ray diffraction spectrometer, atomic force microscope, UV-Vis spectrophotometer, and cyclic voltammetry to analyze and find out the influence of the TiO2 thin film with processing parameters. As the results, the TiO2 thin film in the experiment were all amorphous. When the thickness was 150 nm, it had the best ΔT (ΔT＝Tbleached－Tcolored) was 15.38%, and the best optical density change (ΔOD) was 0.085 at wavelength 550 nm. If the thickness of TiO2 thin film was over 150 nm, it would reduce the ΔT and ΔOD. With the increase of sputtering power, the Rms would increase from 2.561 nm to 4.162 nm. Then, the Ra would increase from 2.013 nm to 3.243 nm. When the sputtering power was 2.0 kw, the TiO2 thin film had the best ΔT was 21.97 %, and the best ΔOD was 0.139 at wavelength 550 nm. The oxygen flow had no notable influence on the electrochemical behavior of the TiO2 thin film. We made the TiO2 thin film with the optimal conditions such as the oxygen flow of 0sccm, sputtering power of 2.0 kw, thickness of 150 nm, argon flow of 40 sccm. At wavelength 550 nm, it had the best ΔT is 21.97 %, and the best ΔOD is 0.139. Then, it also had the maximum oxidization peak is 1.324 mA/cm2 and the maximum reduction peak is -1.805 mA/cm2.