Pattern Formation On Carbon Nanotube Array By Gas Blowing From A Micro-sized Nozzle

• Main Authors: Jen-chieh Cheng, 鄭任傑
• Other Authors: none
• Format: Others
• Language: zh-TW
• Published: 2008
• Online Access: http://ndltd.ncl.edu.tw/handle/79720820782515039451

碩士 === 國立中正大學 === 化學工程所 === 96 === In this study, we used Thermal Chemical Vapor Deposition method to fabricate aligned carbon nanotubes array. We attempted to change the adhesion between CNTs and substrate by adjusting experimental parameters. The first three samples were created at 1050℃, with 2 min of Co sputtering and feeding times of 10 min, 20 min and 40 min. These samples were labeled sample 1, sample 2, and sample 3 respectively. Another sample was created at 900℃, with 40 s of Co sputtering and a feeding time of 10 min. This sample was labeled sample 4. When the samples were synthesized successfully, we jetted the surface of the CNTs array with N2 gas. During the jetting process the gas pressure, the blowing distance and the duration were adjusted. SEM was then used to study the surface morphology of CNTs array that underwent the process. After nitrogen jetting, sample 1 forms an ellipse and looks remotly like a crop circle. Sample 2 forms a pattern and is composed of independent holes. Sample 3 consists of many adjacent holes that form an circular pattern. Sample 4 forms a circular pattern like a crop circle. We observed the evolution of the patterns by increasing the jetting time.