Study of Growth and Property on Field Emission Diamond-Like Carbon Film by MPECVD

• Main Authors: Shin-heng Kuo, 郭信亨
• Other Authors: Sea-Jiou Wang
• Format: Others
• Language: zh-TW
• Published: 2006
• Online Access: http://ndltd.ncl.edu.tw/handle/yjvt86

碩士 === 國立臺北科技大學 === 材料科學與工程研究所 === 95 === Diamond-like carbon film exhibits excellent properties which had a lot of corresponding application at the industry, especially, Diamond-like carbon film present the potentiality of development on the application of the field emission devices within thermal stability , low work function and negative electron affinity. In this study, a dual-ellipsoid type Microwave plasma enhanced chemical vapor deposition equipment for diamond-like carbon film deposition has been developed. The system pressure, H2CH4 flow rate, deposition temperature and microwave power were changed to investigated the microstructure、banding conformation and Field Emission properties of Diamond-like carbon film.Also, we observed the surface and cross section structure, analysis banding conformation and discuss Field Emission properties of Diamond-like carbon film by using Scanning Electron Microscope 、Raman Spectrometer and Electronics Measurement System. We find that the diamond-like carbon ( DLC ) near and outside the plasma can be deposited without heating . The turn-on voltage ( Vth ) decreased and current density increased with lowered the microwave power and H2 / CH4 flow rate. The parameters with microwave power, 400W, and the H2CH4 flow rate, 1:10, will optimize the turnon voltage and current density to 5.5V/μm and 300μm/cm2, respectively.