The study of a titanium oxide film with self-cleaning ability prepared by plasma enhanced chemical vapor deposition technique
碩士 === 國立虎尾科技大學 === 光電與材料科技研究所 === 95 === In the study, amorphous TiOX -SiOX composite film were formed on plastic substrate by plasma enhanced chemical vapor deposition at room temperature from mixtures titanium tetraisopropoxide (TTIP)、 Tertramethylsilane (TMS) and oxygen. Plasma enhanced CVD proc...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2007
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| Online Access: | http://ndltd.ncl.edu.tw/handle/2ma894 |