| Summary: | 碩士 === 國立虎尾科技大學 === 光電與材料科技研究所 === 95 === Abstract
TCO (transparent conductive oxide) is widely used in the optoelectronics, such as solar cells, flat panel display (FPD), and touch panel due to their high visible light transmission and great electrical conductivity. The main purpose of TCO is usually employed as the transparent electrode. These kinds of materials include indium tin oxides (ITO), indium zinc oxides (IZO), and etc. Currently, ITO is the material which is widely used in the industry. However, IZO thin films have great potentials to replace ITO thin films due to it can be deposited at lower temperature while maintaining high visible light transmittance and high electrical conductivity. This low temperature processing capability allows IZO thin films to be applied in many fields, especially the flexible substrate. The experiment result shows that the IZO thin film which was deposited at room temperature with DC power 100 W has the superior property. The film shows the low resistivity of 6E-4 Ω-cm, and high transmission of 90 %. Using the low temperature sputtering process, IZO thin film will be employed for the PLED electrode and deposited on flexible substrate.
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