Development of Ultra-Low-Temperature Polycrystalline Silicon Thin Film Deposition technology

碩士 === 國立臺灣科技大學 === 電子工程系 === 95 === In order to realize the purpose of plastic substrate thin film transistor , We have successfully deposited semitransparent film that the main composition of the film is silicon nitride by using reactive sputtered method. And, it has light absorption (absorption c...

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Bibliographic Details
Main Authors: Tz-Chiang Lai, 賴自強
Other Authors: Wen-chang Yeh
Format: Others
Language:zh-TW
Published: 2007
Online Access:http://ndltd.ncl.edu.tw/handle/91500151403653087461

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