Study of Patent Innovation Mechanism for End Point Detection of Chemical and Mechanical Polishing
碩士 === 國立臺灣科技大學 === 自動化及控制研究所 === 95 === This paper is to develop a patent innovation mechanism for end point detection of chemical and mechanical polishing. It can help users to create innovated patents in the field of end point detection. This research analyzes 110 related patents. The ontology me...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2007
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| Online Access: | http://ndltd.ncl.edu.tw/handle/f929x3 |