| Summary: | 碩士 === 國立臺灣大學 === 工程科學及海洋工程學研究所 === 95 === This thesis took the plasmoic lithography first proposed by Xiangang Luo and Teruya Ishihara et al as the starting point to study the coupled-surface plasmon (SPP) resonance modes. It is anticipated to utilize the learning from the course of this research to develop a nanolithography platform for prototype development.
In the theoretical part, I have derived the physical model and solved the governing equations by using numerical method Nelder-Mead Simplex algorithm. It enables us to find out how to excite the coupled mode by selecting a correct period of the metal grating. The dispersion curves for coupled modes were successfully solved and plot by home-made MATLAB programs. In simulations, we use finite difference time domain (FDTD) to calculate the electromagnetic fields and data analysis by the using MATLAB. We designed three kinds of mask for plasmonic lithography and checked their practicality. Simulation results were verified by using the theoretical prediction.
In experiments, we produced the masks by focused ion beam (FIB) and electron beam lithography (EBL). By integrating metal lift-off process and our newly tried negative resist, EBL were identified to be a powerful tool to produce near-field metal masks including for plasmonic lithography. Its efficiency was found to be even higher than that of FIB. Features of 150 nm in size have been made successfully. The sinusoidal metal grating was also fabricated through the gradient exposure by EBL. For the platform, we retrofit the inverted microscope into a nanolithography platform. It can be controlled automatically by using a friendly interface developed by LabVIEW. This mini exposure system was identified to be suitable for integrating with the nanowriter developed by our Nano-BioMEMS Group since 2003.
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