Analysis of Microstructure Evolution of RF Sputtered Ti1(subscript -x)Al(subscript x)N Affected by Intermediate Layer and Heat Treatment
碩士 === 國立臺灣大學 === 材料科學與工程學研究所 === 95 === In this investigation, the two different hard protective thin film structures: TiAlN/Si&WC and TiAlN/AlN/Si&WC are deposited by RF sputtering system. The advantages of sputtering system is lower surface roughness, higher adhesion and more precise in f...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2007
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| Online Access: | http://ndltd.ncl.edu.tw/handle/00580715575925600020 |