Study of plasma nitridation of Si wafer surface by ICP nitrogen plasma for improving selectivity in High-K material etching process

Study of plasma nitridation of Si wafer surface by ICP nitrogen plasma for improving selectivity in High-K material etching process

碩士 === 國立清華大學 === 工程與系統科學系 === 95 ===

Bibliographic Details
Main Authors:	Cheng Chun Tsai, 蔡承竣
Other Authors:	林滄浪
Format:	Others
Language:	zh-TW
Published:	2007
Online Access:	http://ndltd.ncl.edu.tw/handle/13974127156719866132

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