Characterization of the micro contact resistance using a novel on-chip apparatus
碩士 === 國立清華大學 === 動力機械工程學系 === 95 === This study demonstrates an on chip testing apparatus to determine the variation of contact resistance with the contact force as well as to quantify the change of contact surface roughness after certain contact cycles. Consequently, the relationship between conta...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2007
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/76659006248131085176 |
| Summary: | 碩士 === 國立清華大學 === 動力機械工程學系 === 95 === This study demonstrates an on chip testing apparatus to determine the variation of contact resistance with the contact force as well as to quantify the change of contact surface roughness after certain contact cycles. Consequently, the relationship between contact resistance and interfacial roughness can be characterized. Moreover, the method to calibrate the parasitic resistance for the contact resistance measurement is presented. The resistance of the insulated film formed on the contact interfaces also can be extracted. The experimental results show that mechanical cycling causes an increase in contact resistance and interfacial roughness. In summary, the present on chip apparatus provides detailed information regarding the micro contact testing, and further enables the improvement of RF-MEMS switches and micro-connectors performances.
|
|---|