| Summary: | 碩士 === 國立中山大學 === 電機工程學系研究所 === 95 === Diamond-Like Carbon （DLC）films were successfully deposited on the ITO substrate by electrodeposition technique. This method has several advantages in terms of low cost, rapid growth rates and simple setup. Electrodeposition of DLC thin film was carried out at low DC potential by using a mixture of acetic acid and DI water as electrolyte. The Raman spectra showed two peaks located at 1350cm-1 and 1580cm-1, which were the characterized peaks for DLC films deposited on ITO substrates. By varying the experimental parameters such as the deposited DC potential, distance of electrodes, and the concentrations of solution, the growth mechanism of deposition process was investigated, and the best quality of DLC films was also achieved. Scanning electron microscopy (SEM) and atomic force microscopy (AFM) were used to make insight into accurately the surface morphology of DLC films related to deposited parameters
In addition, according to the experimental results, it indicates that the quality of the DLC film was improved as deposited at higher DC voltage. Finally, to demonstrate the effect of annealing on the interfacial characteristics the C-V and G-V curves of MIS structures are the further works.
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