The Study of Temperature Uniformity of ODF Thermal Processing in the New Generation TFT-LCD

• Main Author: 林貝坤
• Other Authors: 楊文然
• Format: Others
• Language: zh-TW
• Published: 2007
• Online Access: http://ndltd.ncl.edu.tw/handle/97816188456700782446

碩士 === 國立彰化師範大學 === 電機工程學系 === 95 === In the present fabrication process of TFT-LCD（Thin Films Transistor Liquid Crystal Display, TFT-LCD）, thermal processing is indispensable. The heat curing processing with sealant is made in ODF（One Drop Fill, ODF） process of section Cell, and it must go on to bake glass substrate with the heating equipment. The glass substrate has already poured into the liquid crystal at this moment, therefore temperature uniformity is very important, and then often determines the yield of the glass substrate. The thesis is to utilize the general software FLOTHERM to simulate distribution of the fluid and heat flow with the thermal field of heating equipment in a three-dimensional rectangle chamber, and regard probing the temperature uniformity of thermal field. By using base variant hot flux and regular temperature, we can observe two-mode influence of chamber internal thermal field uniformity.