A study of thin film as protective coating by plasma-sputtering on SOFC interconnect

• Main Authors: Jia-meng Chen, 陳佳盟
• Other Authors: 黃豐元, 李雄
• Format: Others
• Language: zh-TW
• Published: 2007
• Online Access: http://ndltd.ncl.edu.tw/handle/63818972828020640565

碩士 === 國立中央大學 === 機械工程研究所 === 95 === In this study, the five commercial metallic materials Crofer22, CS ZMG-232, SS-304, SS-430 and Inconel 718 were investigated. The La0.67Sr0.33MnO3( LSMO ) thin film was coated on those materials using pulsed DC magnetron sputtering. The film was amorphous but converted to perovskite structure after annealing. It was used as protection layer on metallic interconnects in SOFC to prevent the growth of oxide and the diffusion of Cr element. SEM and XRD made use of observing the crystal structure of thin film after annealing. Using GID method and XPS inspects the Cr diffusion and Cr-oxide of LSMO in the high-temperature oxidation environment. The result shows the LSMO thin film on Crofer22 and CS ZMG-232 were good for compaction and adhesion. Thus, it could prevent the growth of oxide and the diffusion of Cr element to avoid poison of cathode and decline of conductivity in SOFC in high temperature. Besides, the coated Crofer22 and CS ZMG-232 proceed ASR measurement in 800℃ for 1150hrs to observe the variation of contact resistance. After ASR measurement, the ASR is 12.42 mohm.cm2 and 62.79 mohm.cm2 respectively.