| Summary: | 碩士 === 國立交通大學 === 工學院碩士在職專班半導體材料與製程設備組 === 95 === The main objective of the thesis is to study the cause of the diagnosis failure of the conventional monitor system for ion implantation processes and thereby set up an effective in-line method to monitor the process. By carrying out a series of experiments to analyze electrical characteristics of the product devices, we found that the conventional monitor system gave a contradictory analysis results against electrical measurements. Therefore it is important to develop a better system to monitor any hardware failure in time to alleviate the end-product loss.
In order to understand why the conventional monitor system failed during the ion implantation process, we studied the relation of the projected range of the ion beam with the implant energy and the implant angle, and the results were correlated with the electrical characteristics of the product device. Based on these studies, an effective monitor system (EMS) was successfully developed. The EMS system has been verified to be very effective to monitor in-line hardware anomaly during ion implantation processes, and implemented in the production line.
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