The Study and Simulation of the Line Pattern having large Depth of Focus by using only Single Exposure and Binary Mask
碩士 === 國立交通大學 === 電子工程系所 === 95 ===
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2007
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/33069964957572258310 |