The Study of High-K CeO2 Nanocrystal Flash Memory with Different Metal Gates and Source/Drain Implantations
碩士 === 國立交通大學 === 電子工程系所 === 95 === In chapter 2,we discuss the dependence of metal gate work functions on the different annealing temperatures. we found a systematic methodology to extract the accurate work function of metal gates .We expect metal gate work-function can play a key role in eliminati...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
2007
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| Online Access: | http://ndltd.ncl.edu.tw/handle/50910478533033155533 |