The Innovative Calibration Method on Large Area Mask Exposure Machine
碩士 === 國立交通大學 === 工學院碩士在職專班精密與自動化工程組 === 95 === Currently, it is very expensive or hard to produce a full stage “golden plate” for large area mask fabricators to calibrate their stage of the exposure tool. Furthermore, it is lack of recessive calibration data or theoretical information for implement...
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ndltd-TW-095NCTU51460192015-10-13T16:14:05Z http://ndltd.ncl.edu.tw/handle/42333932468253027061 The Innovative Calibration Method on Large Area Mask Exposure Machine 大型精密光罩製作兼量測平台其校準方法的創新研究 黃雪鎔 碩士 國立交通大學 工學院碩士在職專班精密與自動化工程組 95 Currently, it is very expensive or hard to produce a full stage “golden plate” for large area mask fabricators to calibrate their stage of the exposure tool. Furthermore, it is lack of recessive calibration data or theoretical information for implementing calibration processes for the metrology tool to measure large area mask to meet the requirement of customers in semiconductor industry. Roughly, there are 2 reasons: First, it is very difficult to order or get the suitable “golden plate”. The price is too high. Second, the technology generation is pushed faster and faster. The lifetime of each generation becomes shorter and shorter. The “golden plate” of former generation tool is no lounger larger enough in full stage calibration for current generation tool to meet the requirements of large area mask customers. The research proposes a simple and practical methodology of metrology and calculation for large area mask exposure machine. The proposed innovative methodology was generated by many series of experimental tests and supported by least squcure statistical method. The metrology and verification software has been developed and evaluated based on large amount of measured data from on line metrology machine for about a year. Applying this methodology, the expected calibration performance shows that it is no longer limited by full stage “golden plate” for large area mask exposure machine. The big advantage is that the expensive metrology tool is not necessary the only choice for the calibration of large area mask exposure tool. Several experiment data results demonstrate and prove the methodology is accurate, reasonable and suitable on current higher accuracy exposure and metrology tools for IC masks. The proposed methodology has been applied to on line large area mask fabrication. The practical performance and the customer’s appreciated feed back have also demonstrated the efficiency and usefulness of the innovative metrology and calibration methodology. Pi-Ying Cheng 鄭璧瑩 2007 學位論文 ; thesis 77 zh-TW |
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碩士 === 國立交通大學 === 工學院碩士在職專班精密與自動化工程組 === 95 === Currently, it is very expensive or hard to produce a full stage “golden plate” for large area mask fabricators to calibrate their stage of the exposure tool. Furthermore, it is lack of recessive calibration data or theoretical information for implementing calibration processes for the metrology tool to measure large area mask to meet the requirement of customers in semiconductor industry. Roughly, there are 2 reasons: First, it is very difficult to order or get the suitable “golden plate”. The price is too high. Second, the technology generation is pushed faster and faster. The lifetime of each generation becomes shorter and shorter. The “golden plate” of former generation tool is no lounger larger enough in full stage calibration for current generation tool to meet the requirements of large area mask customers.
The research proposes a simple and practical methodology of metrology and calculation for large area mask exposure machine. The proposed innovative methodology was generated by many series of experimental tests and supported by least squcure statistical method. The metrology and verification software has been developed and evaluated based on large amount of measured data from on line metrology machine for about a year. Applying this methodology, the expected calibration performance shows that it is no longer limited by full stage “golden plate” for large area mask exposure machine. The big advantage is that the expensive metrology tool is not necessary the only choice for the calibration of large area mask exposure tool.
Several experiment data results demonstrate and prove the methodology is accurate, reasonable and suitable on current higher accuracy exposure and metrology tools for IC masks. The proposed methodology has been applied to on line large area mask fabrication. The practical performance and the customer’s appreciated feed back have also demonstrated the efficiency and usefulness of the innovative metrology and calibration methodology.
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Pi-Ying Cheng |
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Pi-Ying Cheng 黃雪鎔 |
author |
黃雪鎔 |
spellingShingle |
黃雪鎔 The Innovative Calibration Method on Large Area Mask Exposure Machine |
author_sort |
黃雪鎔 |
title |
The Innovative Calibration Method on Large Area Mask Exposure Machine |
title_short |
The Innovative Calibration Method on Large Area Mask Exposure Machine |
title_full |
The Innovative Calibration Method on Large Area Mask Exposure Machine |
title_fullStr |
The Innovative Calibration Method on Large Area Mask Exposure Machine |
title_full_unstemmed |
The Innovative Calibration Method on Large Area Mask Exposure Machine |
title_sort |
innovative calibration method on large area mask exposure machine |
publishDate |
2007 |
url |
http://ndltd.ncl.edu.tw/handle/42333932468253027061 |
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