The Innovative Calibration Method on Large Area Mask Exposure Machine

碩士 === 國立交通大學 === 工學院碩士在職專班精密與自動化工程組 === 95 === Currently, it is very expensive or hard to produce a full stage “golden plate” for large area mask fabricators to calibrate their stage of the exposure tool. Furthermore, it is lack of recessive calibration data or theoretical information for implement...

Full description

Bibliographic Details
Main Author: 黃雪鎔
Other Authors: Pi-Ying Cheng
Format: Others
Language:zh-TW
Published: 2007
Online Access:http://ndltd.ncl.edu.tw/handle/42333932468253027061
id ndltd-TW-095NCTU5146019
record_format oai_dc
spelling ndltd-TW-095NCTU51460192015-10-13T16:14:05Z http://ndltd.ncl.edu.tw/handle/42333932468253027061 The Innovative Calibration Method on Large Area Mask Exposure Machine 大型精密光罩製作兼量測平台其校準方法的創新研究 黃雪鎔 碩士 國立交通大學 工學院碩士在職專班精密與自動化工程組 95 Currently, it is very expensive or hard to produce a full stage “golden plate” for large area mask fabricators to calibrate their stage of the exposure tool. Furthermore, it is lack of recessive calibration data or theoretical information for implementing calibration processes for the metrology tool to measure large area mask to meet the requirement of customers in semiconductor industry. Roughly, there are 2 reasons: First, it is very difficult to order or get the suitable “golden plate”. The price is too high. Second, the technology generation is pushed faster and faster. The lifetime of each generation becomes shorter and shorter. The “golden plate” of former generation tool is no lounger larger enough in full stage calibration for current generation tool to meet the requirements of large area mask customers. The research proposes a simple and practical methodology of metrology and calculation for large area mask exposure machine. The proposed innovative methodology was generated by many series of experimental tests and supported by least squcure statistical method. The metrology and verification software has been developed and evaluated based on large amount of measured data from on line metrology machine for about a year. Applying this methodology, the expected calibration performance shows that it is no longer limited by full stage “golden plate” for large area mask exposure machine. The big advantage is that the expensive metrology tool is not necessary the only choice for the calibration of large area mask exposure tool. Several experiment data results demonstrate and prove the methodology is accurate, reasonable and suitable on current higher accuracy exposure and metrology tools for IC masks. The proposed methodology has been applied to on line large area mask fabrication. The practical performance and the customer’s appreciated feed back have also demonstrated the efficiency and usefulness of the innovative metrology and calibration methodology. Pi-Ying Cheng 鄭璧瑩 2007 學位論文 ; thesis 77 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 碩士 === 國立交通大學 === 工學院碩士在職專班精密與自動化工程組 === 95 === Currently, it is very expensive or hard to produce a full stage “golden plate” for large area mask fabricators to calibrate their stage of the exposure tool. Furthermore, it is lack of recessive calibration data or theoretical information for implementing calibration processes for the metrology tool to measure large area mask to meet the requirement of customers in semiconductor industry. Roughly, there are 2 reasons: First, it is very difficult to order or get the suitable “golden plate”. The price is too high. Second, the technology generation is pushed faster and faster. The lifetime of each generation becomes shorter and shorter. The “golden plate” of former generation tool is no lounger larger enough in full stage calibration for current generation tool to meet the requirements of large area mask customers. The research proposes a simple and practical methodology of metrology and calculation for large area mask exposure machine. The proposed innovative methodology was generated by many series of experimental tests and supported by least squcure statistical method. The metrology and verification software has been developed and evaluated based on large amount of measured data from on line metrology machine for about a year. Applying this methodology, the expected calibration performance shows that it is no longer limited by full stage “golden plate” for large area mask exposure machine. The big advantage is that the expensive metrology tool is not necessary the only choice for the calibration of large area mask exposure tool. Several experiment data results demonstrate and prove the methodology is accurate, reasonable and suitable on current higher accuracy exposure and metrology tools for IC masks. The proposed methodology has been applied to on line large area mask fabrication. The practical performance and the customer’s appreciated feed back have also demonstrated the efficiency and usefulness of the innovative metrology and calibration methodology.
author2 Pi-Ying Cheng
author_facet Pi-Ying Cheng
黃雪鎔
author 黃雪鎔
spellingShingle 黃雪鎔
The Innovative Calibration Method on Large Area Mask Exposure Machine
author_sort 黃雪鎔
title The Innovative Calibration Method on Large Area Mask Exposure Machine
title_short The Innovative Calibration Method on Large Area Mask Exposure Machine
title_full The Innovative Calibration Method on Large Area Mask Exposure Machine
title_fullStr The Innovative Calibration Method on Large Area Mask Exposure Machine
title_full_unstemmed The Innovative Calibration Method on Large Area Mask Exposure Machine
title_sort innovative calibration method on large area mask exposure machine
publishDate 2007
url http://ndltd.ncl.edu.tw/handle/42333932468253027061
work_keys_str_mv AT huángxuěróng theinnovativecalibrationmethodonlargeareamaskexposuremachine
AT huángxuěróng dàxíngjīngmìguāngzhàozhìzuòjiānliàngcèpíngtáiqíxiàozhǔnfāngfǎdechuàngxīnyánjiū
AT huángxuěróng innovativecalibrationmethodonlargeareamaskexposuremachine
_version_ 1717770042319306752