Optimizing Porcess Parameters for furnace Process

碩士 === 國立交通大學 === 管理學院碩士在職專班工業工程與管理組 === 95 === In semiconductor manufacturing, the poly doped diffusion process is designed to produce a layer of thin film. Due to complex physical and chemical reactions, the resistance of the thin film varied dynamically. Frequent adjustments of process parameters...

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Bibliographic Details
Main Authors: Shu_Hui Cheng, 鄭淑慧
Other Authors: Muh-Cherng Wu
Format: Others
Language:zh-TW
Published: 2007
Online Access:http://ndltd.ncl.edu.tw/handle/00196586648080539057