Investigation of Strained-Si NMOSFETs on SiGe Virtual Substrate with Chemical-Mechanical-Polishing Technique

碩士 === 國立成功大學 === 微電子工程研究所碩博士班 === 95 ===   In this thesis, the strained-Si NMOSFETs structures are fabricated on the SiGe virtual substrate. Introduction of tensile strained-Si layer into Si-based structures is attributed to the fact that electron mobility can be enhanced due to energy band splitti...

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Main Authors: Hau-Yu Lin, 林浩宇
Other Authors: San-Lein Wu
Format: Others
Language:en_US
Published: 2007
Online Access:http://ndltd.ncl.edu.tw/handle/57646564998412038992
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spelling ndltd-TW-095NCKU54280242015-10-13T14:16:09Z http://ndltd.ncl.edu.tw/handle/57646564998412038992 Investigation of Strained-Si NMOSFETs on SiGe Virtual Substrate with Chemical-Mechanical-Polishing Technique 利用化學機械式研磨技術改善矽鍺虛擬基板以增進N型應變矽金氧半場效電晶體之研究 Hau-Yu Lin 林浩宇 碩士 國立成功大學 微電子工程研究所碩博士班 95   In this thesis, the strained-Si NMOSFETs structures are fabricated on the SiGe virtual substrate. Introduction of tensile strained-Si layer into Si-based structures is attributed to the fact that electron mobility can be enhanced due to energy band splitting and the reduction of effective mass. However, conventional SiGe virtual substrate usually accompanies the threading dislocation and the roughness of SiO2/Si interface. By utilizing the Chemical Mechanical Polishing technique (CMP), lower threading dislocation density and less interface roughness between SiO2 and Si are obtained. Consequently, DC performance has further been improved.   Additionally, roughness and the defect at interface between the channel and gate oxide generated by threading dislocation make the flicker noise performance worse. At the same way, observing the improvement of flicker noise property is also to prove the superiority of the application of CMP. San-Lein Wu Shoou-Jinn Chang 吳三連 張守進 2007 學位論文 ; thesis 97 en_US
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description 碩士 === 國立成功大學 === 微電子工程研究所碩博士班 === 95 ===   In this thesis, the strained-Si NMOSFETs structures are fabricated on the SiGe virtual substrate. Introduction of tensile strained-Si layer into Si-based structures is attributed to the fact that electron mobility can be enhanced due to energy band splitting and the reduction of effective mass. However, conventional SiGe virtual substrate usually accompanies the threading dislocation and the roughness of SiO2/Si interface. By utilizing the Chemical Mechanical Polishing technique (CMP), lower threading dislocation density and less interface roughness between SiO2 and Si are obtained. Consequently, DC performance has further been improved.   Additionally, roughness and the defect at interface between the channel and gate oxide generated by threading dislocation make the flicker noise performance worse. At the same way, observing the improvement of flicker noise property is also to prove the superiority of the application of CMP.
author2 San-Lein Wu
author_facet San-Lein Wu
Hau-Yu Lin
林浩宇
author Hau-Yu Lin
林浩宇
spellingShingle Hau-Yu Lin
林浩宇
Investigation of Strained-Si NMOSFETs on SiGe Virtual Substrate with Chemical-Mechanical-Polishing Technique
author_sort Hau-Yu Lin
title Investigation of Strained-Si NMOSFETs on SiGe Virtual Substrate with Chemical-Mechanical-Polishing Technique
title_short Investigation of Strained-Si NMOSFETs on SiGe Virtual Substrate with Chemical-Mechanical-Polishing Technique
title_full Investigation of Strained-Si NMOSFETs on SiGe Virtual Substrate with Chemical-Mechanical-Polishing Technique
title_fullStr Investigation of Strained-Si NMOSFETs on SiGe Virtual Substrate with Chemical-Mechanical-Polishing Technique
title_full_unstemmed Investigation of Strained-Si NMOSFETs on SiGe Virtual Substrate with Chemical-Mechanical-Polishing Technique
title_sort investigation of strained-si nmosfets on sige virtual substrate with chemical-mechanical-polishing technique
publishDate 2007
url http://ndltd.ncl.edu.tw/handle/57646564998412038992
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