Investigation of Strained-Si NMOSFETs on SiGe Virtual Substrate with Chemical-Mechanical-Polishing Technique
碩士 === 國立成功大學 === 微電子工程研究所碩博士班 === 95 === In this thesis, the strained-Si NMOSFETs structures are fabricated on the SiGe virtual substrate. Introduction of tensile strained-Si layer into Si-based structures is attributed to the fact that electron mobility can be enhanced due to energy band splitti...
Main Authors: | , |
---|---|
Other Authors: | |
Format: | Others |
Language: | en_US |
Published: |
2007
|
Online Access: | http://ndltd.ncl.edu.tw/handle/57646564998412038992 |
id |
ndltd-TW-095NCKU5428024 |
---|---|
record_format |
oai_dc |
spelling |
ndltd-TW-095NCKU54280242015-10-13T14:16:09Z http://ndltd.ncl.edu.tw/handle/57646564998412038992 Investigation of Strained-Si NMOSFETs on SiGe Virtual Substrate with Chemical-Mechanical-Polishing Technique 利用化學機械式研磨技術改善矽鍺虛擬基板以增進N型應變矽金氧半場效電晶體之研究 Hau-Yu Lin 林浩宇 碩士 國立成功大學 微電子工程研究所碩博士班 95 In this thesis, the strained-Si NMOSFETs structures are fabricated on the SiGe virtual substrate. Introduction of tensile strained-Si layer into Si-based structures is attributed to the fact that electron mobility can be enhanced due to energy band splitting and the reduction of effective mass. However, conventional SiGe virtual substrate usually accompanies the threading dislocation and the roughness of SiO2/Si interface. By utilizing the Chemical Mechanical Polishing technique (CMP), lower threading dislocation density and less interface roughness between SiO2 and Si are obtained. Consequently, DC performance has further been improved. Additionally, roughness and the defect at interface between the channel and gate oxide generated by threading dislocation make the flicker noise performance worse. At the same way, observing the improvement of flicker noise property is also to prove the superiority of the application of CMP. San-Lein Wu Shoou-Jinn Chang 吳三連 張守進 2007 學位論文 ; thesis 97 en_US |
collection |
NDLTD |
language |
en_US |
format |
Others
|
sources |
NDLTD |
description |
碩士 === 國立成功大學 === 微電子工程研究所碩博士班 === 95 === In this thesis, the strained-Si NMOSFETs structures are fabricated on the SiGe virtual substrate. Introduction of tensile strained-Si layer into Si-based structures is attributed to the fact that electron mobility can be enhanced due to energy band splitting and the reduction of effective mass. However, conventional SiGe virtual substrate usually accompanies the threading dislocation and the roughness of SiO2/Si interface. By utilizing the Chemical Mechanical Polishing technique (CMP), lower threading dislocation density and less interface roughness between SiO2 and Si are obtained. Consequently, DC performance has further been improved.
Additionally, roughness and the defect at interface between the channel and gate oxide generated by threading dislocation make the flicker noise performance worse. At the same way, observing the improvement of flicker noise property is also to prove the superiority of the application of CMP.
|
author2 |
San-Lein Wu |
author_facet |
San-Lein Wu Hau-Yu Lin 林浩宇 |
author |
Hau-Yu Lin 林浩宇 |
spellingShingle |
Hau-Yu Lin 林浩宇 Investigation of Strained-Si NMOSFETs on SiGe Virtual Substrate with Chemical-Mechanical-Polishing Technique |
author_sort |
Hau-Yu Lin |
title |
Investigation of Strained-Si NMOSFETs on SiGe Virtual Substrate with Chemical-Mechanical-Polishing Technique |
title_short |
Investigation of Strained-Si NMOSFETs on SiGe Virtual Substrate with Chemical-Mechanical-Polishing Technique |
title_full |
Investigation of Strained-Si NMOSFETs on SiGe Virtual Substrate with Chemical-Mechanical-Polishing Technique |
title_fullStr |
Investigation of Strained-Si NMOSFETs on SiGe Virtual Substrate with Chemical-Mechanical-Polishing Technique |
title_full_unstemmed |
Investigation of Strained-Si NMOSFETs on SiGe Virtual Substrate with Chemical-Mechanical-Polishing Technique |
title_sort |
investigation of strained-si nmosfets on sige virtual substrate with chemical-mechanical-polishing technique |
publishDate |
2007 |
url |
http://ndltd.ncl.edu.tw/handle/57646564998412038992 |
work_keys_str_mv |
AT hauyulin investigationofstrainedsinmosfetsonsigevirtualsubstratewithchemicalmechanicalpolishingtechnique AT línhàoyǔ investigationofstrainedsinmosfetsonsigevirtualsubstratewithchemicalmechanicalpolishingtechnique AT hauyulin lìyònghuàxuéjīxièshìyánmójìshùgǎishànxìduǒxūnǐjībǎnyǐzēngjìnnxíngyīngbiànxìjīnyǎngbànchǎngxiàodiànjīngtǐzhīyánjiū AT línhàoyǔ lìyònghuàxuéjīxièshìyánmójìshùgǎishànxìduǒxūnǐjībǎnyǐzēngjìnnxíngyīngbiànxìjīnyǎngbànchǎngxiàodiànjīngtǐzhīyánjiū |
_version_ |
1717750477095960576 |