The Study of Nanocrystalline Silicon Thin Films Prepared by PECVD and Hot-Wire CVD Technologies for Optic-Electronic Applications
博士 === 國立成功大學 === 微電子工程研究所碩博士班 === 95 === In this dissertation, we report the investigations of nanocrystalline silicon (nc-Si) thin films deposited by both hot-wire chemical vapor deposition (HWCVD) and plasma enhancement chemical vapor deposition (PECVD) with layer-by-layer (LBL) technique in deta...
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| Format: | Others |
| Language: | en_US |
| Online Access: | http://ndltd.ncl.edu.tw/handle/27701545936549298596 |