Control of Heating Lamps in Rapid Thermal Process
碩士 === 國立成功大學 === 航空太空工程學系碩博士班 === 95 === In this thesis, the heating process of 300 mm silicon wafer in the RTP chamber are studied numerically. During the process, the wafer is heated by lamps from room temperature to the designated process temperature rapidly and maintain at that temperature ther...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2007
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| Online Access: | http://ndltd.ncl.edu.tw/handle/36064494702911832887 |
| Summary: | 碩士 === 國立成功大學 === 航空太空工程學系碩博士班 === 95 === In this thesis, the heating process of 300 mm silicon wafer in the RTP chamber are studied numerically.
During the process, the wafer is heated by lamps from room temperature to the designated process temperature rapidly and maintain at that temperature thereafter.
The effects of three-rings and six-rings heating lamps on the temperature uniformity of the wafer are studied.
It is found that three-rings heating lamps lead to large wafer temperature variation due to the wide gap between two rings.
Least-squared errors method and Genetic Algorithm are employed to control the powers of heating lamps.
It is found that least-squared errors method may lead to local optimal combination of heating powers.
If we increase the range searching the global optimum to improve this problem, it'll spend too much time to calculate.
It's found that using Genetic Algorithm to control the powers of heating lamps can save more time searching the global optimum.
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