FAST PATTERNING MICROSTRUCTURES USING INKJET PRINTING CONFORMAL MASKS

• Main Authors: Mau-Ting Yen, 顏茂庭
• Other Authors: 楊錫杭
• Format: Others
• Language: zh-TW
• Published: 2007
• Online Access: http://ndltd.ncl.edu.tw/handle/68807100196406170074

碩士 === 國立中興大學 === 精密工程學系所 === 95 === The presented paper describes a novel process using inkjet printing to pattern a mask onto photoresist for further microstructure formation. The advantages of using the inkjet printing a mask include no Cr photomask required, suitable for non-planar substrate, scalable for large area, and extreme low cost. The ink is ejected from the inkjet print-head controlled by the inkjet system. A CAD pattern from the designer can use this process to place the ink pattern onto the photoresist substrate. Following UV exposure, development, and ink removal, the designed microstructure patterns can be realized in photoresist such as lines and dots. Conventional lithography process uses a rigid photomask to pattern microstructures. It is a conformal mask using as the optical absorber in lithography process the proposed microfabrication process attributer a fast microstructure patterning technology.