| Summary: | 碩士 === 明道大學 === 材料暨系統工程研究所 === 95 === Titanium dioxide films are stable and inexpensive materials which have the photocatalytic characteristic, and have been extensively studied. The band gap of titanium dioxide is 3.2ev, and the absorption wavelength of titanium dioxide is located at UV region. Therefore, the sunlight absorption rate of titanium dioxide films is relatively low. Recently, many researchers pay much effort to improve the activation and visible light absorption rate of titanium dioxide films.
In this study, the effect of adding third elements such as Cr, V and Fe in titanium dioxide films to improve the photocatalytic properties is investigated. The samples were prepared using the compound-type physical vapor deposition system. The high quality titanium dioxide films were first fabricated by the radio-frequency sputtering system, and then the third elements such as Cr, V and Fe were injected into the titanium dioxide film using the Metal Plasma Ion Implanter. Those results show that the band gap of titanium dioxide with third elements is less than 3eV, so the absorption wavelength range of titanium dioxide can be shifted to 400-550nm. As a result, the activation and sunlight absorption rate of titanium dioxide with adding third elements is greatly increased.
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